Semiconductor device fabrication
MOSFET scaling ( process nodes)
0 20 µm – 1968 0 10 µm – 1971 00 6 µm – 1974 00 3 µm – 1977   1.5 µm – 1981 00 1 µm – 1984 800 nm – 1987 600 nm – 1990 350 nm – 1993 250 nm – 1996 180 nm – 1999 130 nm – 2001 0 90 nm – 2003 0 65 nm – 2005 0 45 nm – 2007 0 32 nm – 2009 0 28 nm – 2010 0 22 nm – 2012 0 14 nm – 2014 0 10 nm – 2016 00 7 nm – 2018 00 5 nm – 2020 00 3 nm – 2022
Future 00 2 nm ~ 2024
Half-nodes Density CMOS Device ( multi-gate) Moore's law Transistor count Semiconductor Industry Nanoelectronics
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The 350 nanometer process (350 nm process) is a level of semiconductor process technology that was reached in the 1995–1996 timeframe by leading semiconductor companies like Intel and IBM.

Examples

• SGS-Thomson 5LM ^[1]

Products featuring 350 nm manufacturing process

• MTI VR4300i (1995), used in the Nintendo 64 game console.
• Intel Pentium ( P54CS, 1995), Pentium Pro (1995) and initial Pentium II CPUs ( Klamath, 1997).
• AMD K5 (1996) and original AMD K6 (Model 6, 1997) CPUs.
• МЦСТ-R150 (2001).
• Parallax Propeller (2006), 8 core microcontroller. ^[2]
• Atmel ATmega328, used in the Arduino UNO. ^{[3] [4]}
• Nvidia RIVA 128 (1997) GPU

References

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