Semiconductor device fabrication |
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MOSFET scaling ( process nodes) |
Future
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The 10 μm process (10 micron smallest dimension) is the level of MOSFET semiconductor process technology that was commercially reached around 1971, [1] [2] by leading semiconductor companies such as RCA and Intel.
The i1103 was manufactured on a 6-mask silicon-gate P-MOS process with 8 μm minimum features. The resulting product had a 2,400 μm, 2 memory cell size, a die size just under 10 mm2, and sold for around $21.
Preceded by 20 μm process |
MOSFET semiconductor device fabrication process | Succeeded by 6 μm process |